采用多弧离子镀的方法在TiNi形状记忆合金表面镀覆了厚度为3μm的钽镀层,并对其进行了不同温度的真空退火处理.通过X射线衍射(XRD)研究发现,未经退火的镀层是由不稳定的β-Ta组成,分别经过700, 800, 900℃,1h退火后转变为α-Ta.透射电子显微镜(TEM)的观察发现,采用多弧离子镀的方法可以在TiNi合金表面得到纳米尺寸的β-Ta镀层.在700℃退火时可以得到由40 nm左右的微晶和150 nm左右的较大晶粒混合而成的α-Ta.当退火温度为900℃时,镀层主要由尺寸较大而且均匀的α-Ta组成.
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