欢迎登录材料期刊网

材料期刊网

高级检索

CVI工艺是制备碳基及陶瓷基复合材料的重要工艺.本文利用系统建模思想对CVI工艺模拟研究进行了综述和分析,归纳总结了三类CVI工艺模型:机理模型,辩识模型和定性推理模型;机理模型从传质传热、沉积动力学和孔隙演变三个方面进行了分析和总结,同时,分析CVI工艺三类模型存在的不足,并指出了进一步努力的方向.

参考文献

[1] LI Kezhi,LI Hejun,JIANG Kaiyu,HOU Xianghui.Numerical simulation of isothermal chemical vapor infiltration process in fabrication of carbon-carbon composites by finite element method[J].中国科学E辑(英文版),2000(01):77-85.
[2] DEEPAK EVANS J W .Mathematical model for chemical vapor infiltration with microwave heatedpreform[J].Journal of the American Ceramic Society,1993,76(08):1924-1929.
[3] Hou Xianghui,Li Hejun,Liu Yinglou.Finite difference model for simulation of densifying carbon-carbon composites by chemical vapor infiltration processes[J].航空学报,1999(01):34.
[4] Hou Xianghui;Li Hejun;Chen Yixi .Modeling of chemical vapor infiltration process for fabrication of carbon-carbon composites by finite difference methods[J].Carbon: An International Journal Sponsored by the American Carbon Society,1999(4):669-677.
[5] 姜开宇,李贺军,李克智.2D碳/碳复合材料CVI过程的数值模拟研究[J].宇航学报,1999(04):104-107.
[6] 姜开宇,李贺军,李克智.C/C复合材料热梯度CVI工艺的数值模拟研究[J].复合材料学报,2000(04):84.
[7] Jiang Kaiyu;Li Hejun;Wang Minjie .The numerical simulation of thermal-gradient CVI process on positive pressure condition[J].Materials Letters,2002(5/6):419-423.
[8] Vaidyaraman S.;Agrawal PK.;Starr TL.;Lackey WJ. .1-D MODEL FOR FORCED FLOW-THERMAL GRADIENT CHEMICAL VAPOR INFILTRATION PROCESS FOR CARBON/CARBON COMPOSITES[J].Carbon: An International Journal Sponsored by the American Carbon Society,1996(9):1123-1133.
[9] Teruoki Tago;Motoaki Kawase;Yoshiaki Ikuta;Kenji Hashimoto .Numerical simulation of the thermal-gradient chemical vapor infiltration process for production of fiber-reinforced ceramic composite[J].Chemical Engineering Science,2001(6):2161-2170.
[10] Zhang WG.;Hu ZJ.;Huttinger KJ. .Chemical vapor infiltration of carbon fiber felt: optimization of densification and carbon microstructure[J].Carbon: An International Journal Sponsored by the American Carbon Society,2002(14):2529-2545.
[11] Weigang Zhang;Klaus J.Huttinger .Chemical vapor infiltration of carbon - revised Part I: Model simulations[J].Carbon: An International Journal Sponsored by the American Carbon Society,2001(7):1013-1022.
[12] Weigang Zhang;Klaus J. Huttinger .Simulation studies on chemical vapor infiltration of carbon[J].Composites science and technology,2002(15):1947-1955.
[13] Zijun Hu;J.Huttinger .Chemical vapor infiltration of carbon - revised Part II: Experimental results[J].Carbon: An International Journal Sponsored by the American Carbon Society,2001(7):1023-1032.
[14] Narayana Birakayala;Edward A. Evans .A reduced reaction model for carbon CVD/CVI processes[J].Carbon: An International Journal Sponsored by the American Carbon Society,2002(5):675-683.
[15] FITZER E;FRITZ W;SCHOCH G .Simulation on chemical vapor infiltration of SiC[J].Schoch High Temperatures High Pressures,1992,24:243.
[16] VAN DEN BREKEL C H J;FONVILLE R M M;VAN DER STRATEN P J M.[A].Carbondale:Southern Illinois University Press,1981
[17] MOENE R;DEKKER J P;MAKKEE M .Evalution of isothermal chemical vapor infiltration with langmuir-hinshelwood type kinetics[J].Journal of the Electrochemical Society,1994,141(01):282-290.
[18] GUPTE S M;TSAMOPOULOS J A .An effective medium approach for modeling chemical vapor infiltration of porous ceramic materials[J].Journal of the Electrochemical Society,1990,137(05):1626-1638.
[19] MCALLISTER P;WOLF E E .Modeling of chemical vapor infiltration of carbon in porous carbon substrates[J].CARBON,1991,29(03):387-396.
[20] MCALLISTER P;WOLF E E .Simulation of a multiple substrate reactor for chemical vapor infiltration of pyrolytic carbon with carbon-carbon composites[J].AICHE Journal,1993,39(07):1196-1209.
[21] TAI N H;CHOU T W .Analytical modeling of chemical vapor infiltration in fabrication of ceramic composites[J].Journal of the American Ceramic Society,1989,72(03):414-420.
[22] STARR T L;VINYARD G F;SMITH A W.Modeling of chemical vapor infiltration for ceramic composite fabrication[A].Pennsylvania:Technical Publishing Company,1990:789-796.
[23] SKAMSER D J;JENNINGS H M;JOHNSON D L .Model of chemical vapor infiltration using temperature gradients[J].Journal of Materials Research,1997,12(03):724-737.
[24] 李爱军 .碳/碳复合材料性能预测与ICVI工艺系统虚拟设计[D].,2004.
[25] CURRIER R P .Overlap model for chemical vapor infiltration of carbon in porous carbonsubstrates[J].Journal of the American Ceramic Society,1990,73(08):2274-2280.
[26] SHI Jin;WANG Xue-lei .Robust numerical simulation of porosity evolution in chemical vaporinfiltration Ⅱ:two-dimensional anisotropic fronts[J].Journal of Computational Physics,2002,179:557-577.
[27] SHI Jin;WAN Xue-lei .Robust numerical simulation of porosity evolution in chemical vapor infiltration Ⅲ:three space dimension[J].Journal of Computational Physics,2003,186:582-595.
[28] 徐志淮,李贺军,姜开宇.神经网络模型在SiC涂层制备中的应用[J].无机材料学报,2000(03):509-515.
[29] 徐志淮,李贺军,李克智.SiC-CVD过程的人工神经网络建模[J].硅酸盐学报,2000(01):25-29.
[30] 李爱军,李贺军,李克智,顾正彬.C/C复合材料CVI工艺人工神经网络建模[J].中国科学E辑,2003(03):209-216.
[31] 李爱军,李贺军,李克智,顾正彬.Modeling of CVI process in fabrication of carbon/carbon composites by an artificial neural network[J].中国科学E辑(英文版),2003(02):173-181.
[32] Li Aijun;Li Hejun;Li Kezhi .Applications of neural networks and genetic algorithms to CVI processes in carbon/carbon composites[J].Acta materialia,2004(2):299-305.
[33] Nadi F.;Agogino A.M. .Use of influence diagrams and neural networks in modeling semiconductor manufacturing processes[J].IEEE Transactions on Semiconductor Manufacturing: A Publication of the IEEE Components, Hybrids, and Manufacturing Technology Society, the IEEE Electron Devices Society, the IEEE Reliability Society, the IEEE Solid-State Circuits Council,1991(1):52-58.
[34] 顾正彬,李贺军,李克智,史小红,李爱军.C/C复合材料等温CVI工艺T-S模糊系统研究[J].宇航学报,2004(01):119-122.
[35] 顾正彬,李贺军,李克智,李爱军.C/C复合材料等温CVI工艺Mamdani模糊系统建模[J].材料研究学报,2003(04):375-379.
[36] 顾正彬,李贺军,李克智,李爱军.碳/碳复合材料等温化学气相渗透工艺模糊系统建模[J].硅酸盐学报,2003(07):629-634.
[37] Chiou J.C.;Yang J.Y. .A CVD epitaxial deposition in a vertical barrel reactor: processmodeling using cluster-based fuzzy logic models[J].IEEE Transactions on Semiconductor Manufacturing: A Publication of the IEEE Components, Hybrids, and Manufacturing Technology Society, the IEEE Electron Devices Society, the IEEE Reliability Society, the IEEE Solid-State Circuits Council,1998(4):645-653.
[38] Geisler J.P.;Lee C.S.G.;May G.S. .Neurofuzzy modeling of chemical vapor deposition processes[J].IEEE Transactions on Semiconductor Manufacturing: A Publication of the IEEE Components, Hybrids, and Manufacturing Technology Society, the IEEE Electron Devices Society, the IEEE Reliability Society, the IEEE Solid-State Circuits Council,2000(1):46-60.
上一张 下一张
上一张 下一张
计量
  • 下载量()
  • 访问量()
文章评分
  • 您的评分:
  • 1
    0%
  • 2
    0%
  • 3
    0%
  • 4
    0%
  • 5
    0%