利用电化学沉积法,在AAO模板上制备了铁磁性金属Ni纳米线有序阵列.通过XRD、SEM等分析测试方法研究了制备工艺与Ni纳米线结构的关系,并在此基础上研究了结构对其磁性能的影响.在恒定沉积电压为-2 V时,适当的电流密度(2 mA/cm2)以及较长的沉积时间(9 h),有助于得到沿着[220]方向的高织构性纳米线.另外,相对于多晶结构,单晶或高织构性结构的Ni纳米线具有较高的矫顽力、剩磁及更显著的磁各向异性.
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