在室温下,利用等离子体增强的化学气相沉积法(PECVD)在硅衬底上制备了非晶碳氢薄膜.采用100keV,剂量分别为1.0×1015、5.0×1015、5.0×1016和1.0×1017 ions/cm2的He离子(He+)对非晶碳氢薄膜进行辐照实验.通过基于原子力显微镜(AFM)的纳米压痕和纳米划痕技术,对He+辐照前后碳氢薄膜的表面硬度进行分析.结果表明,经He+辐照后碳氢薄膜的表面硬度明显增加,并且随着He+辐照剂量增加,碳氢薄膜的表面硬度呈逐渐增加的趋势.傅里叶变换红外光谱(FT-IR)和拉曼光谱分析表明,He+辐照会导致碳氢薄膜中sp2C键含量明显增加,而sp3C键及H原子的含量明显降低,这可能是引起碳氢薄膜硬度变化的主要原因.
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