调节磁控溅射工艺中氧气的含量，在玻璃基片上制备了ITO 薄膜.研究氧气含量对 ITO 薄膜光学、电学性能的影响，以及在高温、高温高湿、碱性环境及经时的电学性能的稳定性.结果表明，氧气含量的增加会降低沉积速率；氧气含量对 ITO 薄膜在可见光区内的透光率影响较小，但会引起峰值透光率蓝移；对电学性能及其稳定性影响较大，氧气含量在1％(体积分数)以内时，电学性能呈先降低后升高的变化，在0．4％(体积分数)时具有较低的电阻率，且在各种环境中具有较高的稳定性；氧气含量高于1％(体积分数)，电学性能及其稳定性变差.
ITO films under different oxygen content were deposited by magnetron sputtering on glass substrates. The effects of oxygen content on the optical,electrical properties as well as stability of ITO films under high temperature,high temperature and high humidity,alkaline environments and time-dependent are studied.The results show that the increasing of oxygen content reduces the deposition rate.The oxygen content has a little influence on the visible transmittance,and causes the blue shift of peak transmittance.However,the oxygen content has a great impact on the electrical property and stability.When the oxygen content was less than 1vol%,the electrical property firstly decrease and then increase,and the optimal resistivity was achieved at 0.4 vol% oxygen content.Furthermore,the electrical property has high stability in various environments.When the oxygen content exceeds 1 vol%,the electrical properties and its stability are deteriorated.
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