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用X射线衍射仪、原子力显微镜和磁强计研究了Ta缓冲层厚度变化时,Ta/FeMn/NiFe/Ta多层膜微观结构和磁性能的变化,分析了其微观结构和磁性能之间的关系。实验结果表明,随 Ta 缓冲层厚度增加,FeMn层织构、晶粒尺寸、位错密度、应变和界面粗糙度都发生明显变化,并且这些变化影响了多层膜的偏置场(H ex )和矫顽力(H c )的大小。结合实验现象和交换偏置(EB)的物理本质,讨论了微观结构对交换偏置的影响机理。

Microstructures and magnetic properties of the Ta/NiFe/FeMn/Ta system with Ta buffer layer thick-ness varying were investigated by X-ray diffraction,atomic force microscope,and vibrating film magnetometer, respectively.Experimental results show that FeMn texture,grain size,dislocation density,strain rate and in-terface roughness changed a lot with the thickening Ta buffer layer.And the change of microstructures finally acts on the values of bias field (H ex )and coercivity (H c ).Combining with the experimental results and the physical essence of exchange biasing (EB),we analyzed the mechanism of microstructures change on EB.

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