采用直流/射频耦合反应磁控溅射法在Si(111)衬底上使用高纯石墨靶材制备出了类金刚石(DLC)薄膜.分别采用表面轮廓仪、激光拉曼光谱、傅里叶变换红外光谱、X射线光电子能谱、扫描电镜、白光干涉仪、纳米压痕对薄膜的性能进行了表征和分析.研究了沉积过程中不同工作气压(0．35~1．25 Pa)对薄膜沉积速率、结构、表面形貌及力学性能的影响.研究表明，随着工作气压的升高，薄膜的沉积速率逐渐减小，薄膜中 sp3含量先升高后降低；薄膜表面粗糙度随工作气压的升高呈现出先降低后升高的趋势，且在工作气压为1．0 Pa时达到最小值6．68 nm；随着工作气压的升高，薄膜的显微硬度与体弹性模量先升高后降低，且在工作气压为1．0 Pa时分别达到最大值11．6和120．7 GPa.
Diamond like carbon films were deposited on Si (111)substrates by coupling DC and RF reactive mag-netron sputtering from pure carbon target.The films were characterized and analyzed by stylus profilometer, Raman spectra,Fourier transform infrared spectrometer,XPS,SEM,white light interferometer and nanoin-dentation techniques.The effects of working pressure on the deposition rate,structure,morphology and hard-ness properties were investigated.The working pressure was varied between 0.35 and 1.25 Pa.It was found that as the working pressure increased,the deposition rate decreased gradually and the sp3 content in the films first increased then decreased;the surface roughness presented a trend that first decreased then increased and gained the minimum surface roughness which is 6.68nm at the working pressure of 1.0 Pa.With the pressure increas-ing,both hardness and modules of films first increased then decreased,and reached the maximum value of 1 1 .6 and 120.7 GPa respectively at the work pressure of 1.0 Pa.
参考文献
| [1] | Cokun, Ozlem Duyar;Zerrin, Taner.Optical, structural and bonding properties of diamond-like amorphous carbon films deposited by DC magnetron sputtering[J].Diamond and Related Materials,2015:29-35. |
| [2] | A. Sikora;F. Garrelie;C. Donnet;A. S. Loir;J. Fontaine;J. C. Sanchez-Lopez;T. C. Rojas.Structure of diamondlike carbon films deposited by femtosecond and nanosecond pulsed laser ablation[J].Journal of Applied Physics,201011(11):113516-1-113516-9. |
| [3] | 王雪敏;吴卫东;李盛印;白黎;唐永建;王锋.类金刚石膜在ICF研究中的潜在应用[J].激光与光电子学进展,2009(1):60-66. |
| [4] | Chu PK;Li LH.Characterization of amorphous and nanocrystalline carbon films[J].Materials Chemistry and Physics,20062/3(2/3):253-277. |
| [5] | Deng, X.R.;Leng, Y.X.;Dong, X.;Sun, H.;Huang, N..Effect of hydrogen flow on the properties of hydrogenated amorphous carbon films fabricated by electron cyclotron resonance plasma enhanced chemical vapor deposition[J].Surface & Coatings Technology,20115(5):1007-1010. |
| [6] | J.L. Andujar;F.J. Pino;M.C. Polo;A. Pinyol;C. Corbella;E. Bertran.Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films[J].Diamond and Related Materials,20023-6(3-6):1005-1009. |
| [7] | Stowell M;Muller J;Ruske M;Lutz M;Linz T.RF-superimposed DC and pulsed DC sputtering for deposition of transparent conductive oxides[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,200719(19):7654-7657. |
| [8] | Ho-Chul Lee.The behaviors of the carrier concentrations and mobilities in indium-tin-oxide thin films by DC and RF-superimposed DC reactive magnetron sputtering at the various process temperatures[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,20068(8):2647-2656. |
| [9] | M. Bender;J. Trube;J. Stollenwerk.Deposition of transparent and conducting indium-tin-oxide films by the r.f. -superimposed DC sputtering technology[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,19991/2(1/2):100-105. |
| [10] | Ech-Chamikh E;Essafti A;Ijdiyaou Y;Azizan M.XPS study of amorphous carbon nitride (a-C : N) thin films deposited by reactive RF sputtering[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,200610(10):1420-1423. |
| [11] | N. Wang;K. Komvopoulos.Incidence Angle Effect of Energetic Carbon Ions on Deposition Rate, Topography, and Structure of Ultrathin Amorphous Carbon Films Deposited by Filtered Cathodic Vacuum Arc[J].IEEE Transactions on Magnetics,20127(7):2220-2227. |
| [12] | T. Mikami;H. Nakazawa;M. Kudo;M. Mashita.Effects of hydrogen on film properties of diamond-like carbon films prepared by reactive radio-frequency magnetron sputtering using hydrogen gas[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,20051/2(1/2):87-92. |
| [13] | Nakao, S.;Yukimura, K.;Ogiso, H.;Nakano, S.;Sonoda, T..Effects of Ar gas pressure on microstructure of DLC films deposited by high-power pulsed magnetron sputtering (Conference Paper)[J].Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology,2013:261-266. |
| [14] | Khatir, S.;Hirose, A.;Xiao, C..Coating diamond-like carbon films on polymer substrates by inductively coupled plasma assisted sputtering[J].Surface & Coatings Technology,2014:96-99. |
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