用原子力显微镜(AFM)和X射线衍射(XRD)研究了不同厚度Cu/Co双层膜的表面形貌和微观结构,并用振动样品磁强计(VSM)测量了磁滞回线.实验结果表明,薄膜表面由均匀岛状结构组成,随着Co薄膜厚度增加,"小岛"高度升高,之后部分"小岛"发生合并长大.当Co薄膜厚度为5和15 nm时,Co为fcc结构;当Co薄膜厚度为30 nm时,fcc结构和hcp结构同时存在.此外,随着Co薄膜厚度增加,对应磁滞回线矩形度逐渐变大,并且矫顽力和饱和磁化强度逐渐增大.
The surface morphology and microstructure of Cu/Co bilayer films with different thickness were investigated by atomic force microscope (AFM) and X-ray diffraction (XRD), and the hysteresis loops of Cu/Co bilayer films were measured by vibrating sample magnetometer (VSM).The results reveal that the surface of the films was composed of uniform islands.As Co films thickness increased, the height of islands increased while parts of them merged and grew up.Only fcc Co films obtained at the thickness of 5 and 15 nm, but fcc and hcp coexisted while Co films grew up to 30 nm.Further investigation shows that coercive force, saturation magnetization and squareness of hysteresis loops increased with the deposition of Co films.
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