用循环Ar+轰击-磁控溅射离子镀(MSIP)法在U表面上镀Al,并采用俄歇电子能谱仪(SAM)、扫描电镜(SEM)、电化学实验和湿热腐蚀加速实验,研究了其表面、剖面形貌和耐蚀性能,以及U基和Al镀层界面.结果表明:U上循环Ar+轰击-磁控溅射离子镀Al界面存在较宽的原子共混区,且耐蚀性能明显优于常规磁控溅射离子镀Al.
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