采用扫描电镜(SEM)、能谱仪(EDS)、X射线结构衍射仪(XRD)及拉伸实验等方法,研究了铀(U)上磁控溅射Al镀层在480℃,2小时,60 MPa条件下热等静压(HIP)处理对界面特性以及膜基结合强度的影响.结果表明:经HIP处理后,镀层密度达到了其理论密度;镀层由柱状晶转变为致密的层状结构,在界面处Al、U元素形成了互扩散,并生成了金属间化合物UAl2和UAl3;膜基结合形成了冶金结合,结合强度有所增强.
参考文献
| [1] | Orman S.The corrosion behavior of nickel plated uranium[J].Corrosion Science,1972,12:35. |
| [2] | Chang F C,Levy M,Jackman B.Assessment of corrosion-resistant coating for a depleted U-0.75 Ti Alloys[J].Surface and Coatings Technology,1989,39/40:721. |
| [3] | 鲜晓斌,吕学超.张永彬.在U表面循环Ar+轰击-磁控溅射离子镀Al研究[J].腐蚀科学与防护技术,2002,14(2):98. |
| [4] | Abdel-Samed A,E Lngscheider,K Bobzin.The in fluence of hot isostatie pressing on plasma sprayed coatings properties[J].Surface & Coatings Technology,2006(201):1224. |
| [5] | Kim M T,Chang S Y,Won J B.Effect of hot isostatic pressing on the microstructure and mechanical properties of vitreous enamel coatings on low carbon steel[J].Surface & Coatings Technology,2006(201):3281. |
| [6] | Castleman L S.Layer growth during Interdiffusion in the aluminum-uranium alloy system[J].Journal of Nuclear Materials,1961,3(1):1. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%