研制了一种锌基合金电镀添加剂EA-2。采用FTIR分析了EA-2的结构,并对其分散能力、覆盖能力、光亮整平能力等性能进行了一系列的测试。结果表明:EA-2能明显提高镀液的稳定性,所得镀层具有平整、光亮、致密、结合力强等优良特性。
Additive EA-2 for zinc based alloy electroplating was synthesized. Properties of EA-2 were determined such as the abilities of leveling, brightening and throwing power. The results show that bath stability is greatly improved by addition of EA-2. Bright, compact and uniform zinc or zinc based alloy deposits with good adhesion are obtained.
参考文献
[1] | 严钦元.现代电镀与表面精饰添加剂[M].北京:中国科学技术出版社,1994 |
[2] | 舒余德;张昭;唐瑞仁 等.电镀添加剂作用机理的发展概况[J].电镀与环保,1999,19(06):6. |
[3] | Monev M;Dobrev TS .Determination of throwing power using the Hull cell[J].Metal Finishing,1992,10:50-53. |
[4] | 何为 .锌镍合金的异常共沉积与正常共沉积的转变[J].表面技术,1998,27(02):22. |
[5] | 吴水清 .镀锌光亮剂的研究进展[J].电镀与环保,1991,11(02):6. |
[6] | 马冲.高性能低氰镀锌光亮剂A.T的研究[J].材料保护,1991(07):22. |
[7] | 周长虹 .弱酸性氯化钾(钠)光亮镀锌[J].电镀与环保,1995,15(02):17. |
[8] | Pushpavanam M.;Balakrishnan K. .ZINC-NICKEL ALLOY ELECTRODEPOSITION FROM UNCOMPLEXED ACID BATH[J].Journal of Applied Electrochemistry,1996(3):283-290. |
[9] | Lee K H .The effect of Some binary additive systems in the electrodeposition of Cadmium[J].Analysis Science and Technology,1996,9(02):161. |
[10] | Kang J C .Electrodeposition and characterization of amorphous iron-chromium-phosphorus-carbon alloy[J].Journal of Applied Electrochemistry,1992,22(09):787. |
[11] | Thomas F C .Effect of some additives on volumes or activation in the electrodeposition of cobalt. nickel. and silver[J].Journal of Electrochemistry,1989,136:3627. |
[12] | Emil R .Struktur und wirkung organischer zuesatze in galvanischen Baedern[J].Galvanotechnik,1990,81(11):3470. |
[13] | Emil R .Struktur and mode of aetion of organic additives in electroplating baths[J].Galvanotechnik,1990,81(11):3860. |
[14] | 王瑞祥.氯锌-1号氯化钾(钠)光亮镀锌的研究与应用[J].电镀与精饰,1989(05):6. |
[15] | 郭粤湘.电镀添加剂的整平机理[J].电镀与精饰,1990(02):6. |
[16] | 方景礼 .电镀添加剂总论[J].表面技术,1992,136(01):145. |
[17] | 方景礼 .电镀添加剂总论[J].表面技术,1992,137(02):151. |
[18] | 方景礼 .电镀添加剂总论[J].表面技术,1992,138(03):154. |
[19] | 方景礼 .电镀添加剂总论[J].表面技术,1993,139(04):177. |
[20] | 方景礼 .电镀添加剂总论[J].表面技术,1993,140(05):133. |
[21] | 方景礼 .电镀添加剂总论[J].表面技术,1993,141:154. |
[22] | 方景礼 .电镀添加剂总论[J].表面技术,1993,142:148. |
[23] | 刘红霞,蔡志华.丙炔基磺酸钠的合成及其在电镀中的应用[J].材料保护,1996(05):26. |
[24] | 陈永言,黄清安.电位扫描法研究氯化钾镀锌添加剂[J].材料保护,1995(09):1. |
[25] | 曾华梁;吴仲达;秦月文.电镀工艺手册[M].北京:机械工业出版社,1996 |
[26] | 张昭;刘毅强;舒余德 等.无限微元法求Hull槽阴极电流分布[J].电镀与环保,1999,19(04):12. |
[27] | 张昭,舒余德,唐瑞仁,张鉴清,曹楚南.含磷锌基合金电镀添加剂的研制及模糊评定[J].电镀与涂饰,2000(03):17-20. |
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