铜箔是制造印制板的关键性导电材料,它的性能与其表面处理工艺密切相关.着重介绍了一些常用的电解铜箔表面处理工艺规范和镀层特点,概述了当前铜箔表面处理工艺包括高温耐热表面处理、双面铜箔表面处理、超薄铜箔表面处理、高抗张性铜箔表面处理和高频电路用铜箔表面处理等工艺的研究现状.展望了印制板用铜箔的发展趋势.
参考文献
[1] | 王卫平.电子产品制造技术[M].北京:清华大学出版社,2005:146. |
[2] | 刘仁志.离子迁移对印刷线路板绝缘性能的影响[J].电镀与精饰,2001(06):8-10. |
[3] | 金荣涛.电解铜箔双面处理生产工艺的选择[J].有色冶炼,1995(05):33. |
[4] | CHARLES C C .Conducting element and method[P].US 3220897,1965. |
[5] | BETTY M L;WILLOWICK MITLONL .Selker.Conducting element having improved bonding characteristics and method[P].US 3293109,1966. |
[6] | HISANONRI M KURISUNO;MASASTO Takami .[P].US 20020011418Al,2002. |
[7] | 张世超,石伟玉,白致铭.铜箔表面粗化工艺的研究[J].电镀与精饰,2005(05):1-3. |
[8] | CHARLES B Y;ADAM M W;EDGEWATER P .Copper foil treatment and products produced therefrom[P].US 3857681,1974. |
[9] | 赵为上.电解铜箔镀镍表面处理[M].上海:上海大学出版社,2006:54. |
[10] | HIROSHI N .Nickel coated copper foil for a printed circuit[P].GB 2073779A,1981. |
[11] | HIROSHI N YOKOHAMA .Copper foil for a printed circuit and a method for the production thereof[P].US 4483906,1984. |
[12] | BETTY M L;BETTY L B;WILLOWICK .Printed circuit board and method of making same[P].US 3585010,1971. |
[13] | 阿曾和义;野口昌巳;小林胜已 等.新的铜锌电镀浴印制电路板铜箔及其表面处理方法[P].CN 1111685A,1995. |
[14] | HINO EIJI YAMANISHI .Surface treatment method of a copper foil for printed circuits[P].EP 0541997,1992. |
[15] | JOHN T;MICHAEL B .Treatment of copper foil:WIPO[P].WO 8202991,1982. |
[16] | CHARLES B Y;GEORGE G;CHINSAI T .Process for electrodeposition of barrier layer over copper foil bonding treatment,products thereof and electrolyte useful in such process[P].US 6224991,2001. |
[17] | HISHI N;YOKOHAMA .Copper foil for a printed circuitand a method for the production thereofUS 4376154[P].GB 2010910A,1983. |
[18] | HIROSHI N .Nickel plated copper foil for a printed circuitGB 2073778A[P].GB 2010910A,1981. |
[19] | BETTY L B;BETTY M L .Printed circuit board having etchable copper and nickel layers[P].GB 2010910A,1979. |
[20] | BETTY L B;BETTY M L .Printed circuit board having mutually etchable copper and nickel layers[P].US 4311768,1982. |
[21] | SANG-Kyum K ANYANG;CHOI Chang-hee .Electrodeposited copper foil for PCB having barrier layer of Zn-Co-As and surface treatment method of the copper foil[P].US 20030121789A1,2003. |
[22] | TORDAY JOHN;M JAMES .Treatment of copper foil[P].EP 0112635,1984. |
[23] | WOLSKI A M;CHENG C T;SIMON Richard B .Treatment for copper foil[P].US 4572768,1985. |
[24] | 田民波;林金堵;祝大同.高密度封装基板[M].北京:清华大学出版社,2003:394-397. |
[25] | 辜信实.挠性覆铜板用铜箔[J].印制电路信息,2004(04):13-16,40. |
[26] | CHIU Yen-chiu;OUNG Jung-Chou;LIU Jin-Yaw .Surface treatmentfor a wrought copper foil for use on a flexible printed circuit board (FPCB)[P].US 20040108211A1,2004. |
[27] | 藤原久和;丹博司;藤井光南 等.具有优良的耐化学性和耐热性的用于印制线路板的铜箔[P].CN 1260684A,2000. |
[28] | 崔国峰,李宁,黎德育.化学镀铜在微电子领域中的应用及展望[J].电镀与环保,2003(05):5-7. |
[29] | 土田克之;熊谷正志;赤濑文彰 .表面处理铜箔[P].CN 1545570A,2004. |
[30] | 铃木昭利;福田伸;星野和弘 等.高密度超精细电路板用铜箔[P].CN 1466517A,2004. |
[31] | 酒井久雄;横田俊子;浅井务 等.高抗张强度电解铜箔及其制造方法[P].CN 1193360A,1998. |
[32] | 蓧崎健作 .用于高频率的铜箔及其制造方法[P].CN 1530469A,2004. |
[33] | 杨宏强,王洪.亚洲PCB产业现状[J].印制电路信息,2005(07):15-17. |
[34] | 冷大光;胡京江;郭宗训 等.电解铜箔镀锌工艺的研究[J].金属学报,1998,34(11):1227-1229. |
[35] | 杨培霞,安茂忠,胡旭日,徐树民,蒲宇达.印制板用电解铜箔后处理工艺的研究[J].电镀与涂饰,2005(08):42-45. |
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