用弯曲磁过滤提高弧离子镀TiN薄膜质量

兵器材料科学与工程 , 2008, 31(4): 36-40. doi: 10.3969/j.issn.1004-244X.2008.04.009

用弯曲磁过滤提高弧离子镀TiN薄膜质量

瞿全炎 ^1, , 曾德长 ^2, , 史新伟 ^3, , 刘正义 ^4,

1.华南理工大学,机械工程学院,广东,广州,510640;广东省特种设备检测院,广东,广州,510655

2.华南理工大学,机械工程学院,广东,广州,510640

3.郑州大学,材料科学与工程学院,河南,郑州,450052

4.华南理工大学,机械工程学院,广东,广州,510640

基金项目: 广东省广州市科技计划(2006Z2-D0131;2006Z3-D0281)

关键词： TiN薄膜 , 弯曲磁过滤 , 薄膜质量 , 粗大柱状晶 , 细小柱状晶

Effect of curved magnetic filtering on quality of TiN thin films prepared by the AIP technique

采用弯曲磁过滤真空阴极放电弧离子镀法制备高质量TiN薄膜.用场致发射电子扫描显微镜观察薄膜表面与截面形貌.分析弯曲磁过滤对膜表面质量与晶粒尺寸、膜基结合形态的影响.磁过滤能有效减少大颗粒数量,减小大颗粒尺寸.形成光滑的TiN薄膜表面,细化TiN晶粒,形成结合紧密的膜基结构.

参考文献

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用弯曲磁过滤提高弧离子镀TiN薄膜质量

Effect of curved magnetic filtering on quality of TiN thin films prepared by the AIP technique

参考文献