氧化锌(ZnO)是直接宽带隙半导体材料,有高达60 meV的激子束缚能,是下一代短波长光电材料的潜在材料.有效的p型ZnO薄膜掺杂是实现ZnO基光电器件的基础,虽然取得一定的进展,但从性能上来看,远远不及n型ZnO薄膜,而且重复性差.分析难于实现氧化锌p型掺杂的主要原因,综述近年来出现的p型掺杂的新方法、掺杂机制及其有效的实现工艺,指出今后的发展趋势和研究重点.
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