研究双离子束溅射组装铜钨复合膜Ar+能量及束流对膜影响.用XRD分析溅射沉积后的薄膜结构.实验结果表明,随靶Ar+能量和束流增加,铜钨膜向晶态化转变.铜钨复合膜的沉积速率主要由钨靶Ar+束流决定,并且增加气压会使复合膜晶粒尺寸变小,固溶进钨的铜原子也会相应减少.
参考文献
| [1] | Paturaud C;Farges G;Sainte Catherine M C et al.Influence of sputtering gases on the properties of magnetron sputtere tungsten films[J].Surface and Coatings Technology,1996,86/87(01):388-393. |
| [2] | Ligot J;Benayoun S;Hantzpergue J J et al.Sputtered tungsten films on polyimide on application for X-ray masks[J].Solid-State Electronics,1999,43:1075. |
| [3] | Radie N;Grzeta B;Milat O et al.Tungsten-carbon films prepared by reactive sputtering from argon benzene discharges[J].Thin Solid Films,1998,33:3401-3405. |
| [4] | Zhao B.;Li DM.;Zeng F.;Pan F. .Ion beam induced formation of metastable alloy phases in Cu-Mo system during ion beam assisted deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2003(1/4):334-340. |
| [5] | Radic N;Grzeta B;Gracin D et al.Preparation and structure of Cu-W thin films[J].Thin Solid Films,1993,228:225-228. |
| [6] | Auciello O;Chevacharoenkul S;Amenn M S et al.Controlled Ion beam sputter deposition of W/Cu/W layered films for microelectronic applications[J].Journal of Vacuum Science and Technology,1991,9(03):625-631. |
| [7] | Whal K J;Seitzman L E;Bolster R N et al.Ion-beam deposited Cu-Mo coatings high temperature solid lubricants[J].Surface and Coatings Technology,1997,89:245-251. |
| [8] | Pacand J;Gladyszewski G;Jaouen C et al.Low temperature mixing in.Cu/W superlattices irradiated with light and heavy ions[J].Applied Physics,1993,73(06):2786-2793. |
| [9] | Oron M;Adams C M Jr .Morphology of Cu-W and Cu-Mo films prepared by electron-beam Co-deposition[J].Applied Physics,1968,40:4218-4220. |
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