利用多弧离子镀方法,在HSS钢基体上沉积了TiA lN/Ti多元复合涂层,通过AES、XTEM以及EDS等手段,研究了涂层的界面结构.结果表明,在 TiAlN-Ti界面、Ti-HSS界面分别存在Ti2AlN和FeTi界面相,Ti2AlN是在涂镀过程中直接沉积而来,而FeTi界面相则是通过扩散作用生成的,它的基体中的M有一定的位相关系.
参考文献
[1] | SUNDGREN J E .Structure and properties of TiN coatings[J].Thin Solid Films,1985,128:21-44. |
[2] | SPROUL W D;ROTHSTEIN R .High hate reactively sputtered TiN c oating on HSS drill[J].Thin Solid Films,1985,126:257-263. |
[3] | MUNZ W D .Titanium aluminum nitride films: A new atternative to TiN coatings[J].Journal of Vacuum Science and Technology,1986,4(06):2717-2725. |
[4] | TOMISLOV GREDIC;MIODRAG ZLATANOVIC .Plasma deposition of (Ti ,Al)N coating at various magnetron discharge power levels[J].Surface and Coatings Technology,1991,48:25-30. |
[5] | JOSHI A;HU H S .Oxidation behavior of titanium-aluminum nit rides[J].Surface and Coatings Technology,1995,76/77:499-507. |
[6] | COLL B F;SATHRUM P .Optimization of arc evaporated (Ti,Al)N film composition for cutting tool applications[J].Surface and Coatings Technology,1992,5 2:57-64. |
[7] | SCHUSTER J C;BAUER J .The ternary system titamium-aluminum -nitrogen[J].Solid-state chemistry,1984,53:260-265. |
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