衬底温度对沉积的NiTi薄膜晶化行为的影响

材料科学与工艺, 2003, 11(3): 251-253. doi: 10.3969/j.issn.1005-0299.2003.03.008

衬底温度对沉积的NiTi薄膜晶化行为的影响

李永华 ^1, , 纪红 ^2, , 孟繁玲 ^3, , 邱利霞 ^4, , 郑伟涛 ^5, , 王煜明 ^6,

1.吉林大学,麦克德尔米德实验室材料系,吉林,长春,130023

2.吉林大学物理学院,吉林,长春,130023

3.吉林大学,麦克德尔米德实验室材料系,吉林,长春,130023

4.吉林大学,麦克德尔米德实验室材料系,吉林,长春,130023

5.吉林大学,麦克德尔米德实验室材料系,吉林,长春,130023

6.吉林大学,麦克德尔米德实验室材料系,吉林,长春,130023

基金项目: 高等学校博士学科点专项科研项目吉林省科技厅科研项目(20020611)

关键词： NiTi薄膜 , 晶化粒子 , 小角X射线散射

Effect of substrate temperature on crystallization behavior of NiTi thin films

将采用直流磁控溅射方法制备的NiTi薄膜沉积在热的衬底上,应用X射线散射和小角X射线散射技术研究了NiTi合金薄膜中生成的晶化粒子的界面特征和晶粒大小.结果表明:衬底加热可降低薄膜的晶化温度,衬底温度在350℃以上,溅射的NiTi薄膜已部分晶化;衬底温度在350、370℃和420℃溅射的NiTi薄膜,对应的晶化粒子的半径分别是2.40、2.59、2.81 nm;薄膜中的晶化粒子以形核长大的方式进行,结晶粒子与基底之间有清晰的界面.

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材料期刊网

衬底温度对沉积的NiTi薄膜晶化行为的影响

Effect of substrate temperature on crystallization behavior of NiTi thin films

参考文献