为了研究靶形状对等离子体基离子注入均匀性的影响,应用Auger电子能谱(AES)剖面分析,测量并计算了正方形靶表面排布的Ti试样经氮等离子体基离子注入(PBII)的保留剂量分布.由于N的Auger电子发射能量与Ti的完全重合,而且表面氧化层对Ti的Auger跃迁产生很大的影响,因此应用AES对于氮等离子体基离子注入钛基金属进行化学分析变得较为复杂.本文探讨了一种既解决峰位重叠问题又考虑氧化层影响的方法,从而能够根据AES溅射剖面分析数据计算浓度深度曲线,并获得保留剂量.正方形靶表面不同位置处的剂量测算结果表明,靶的形状对于保留剂量有着很大的影响,造成剂量呈梯度分布.同时还发现,Ti氧化层随着保留剂量的增大而增厚.
参考文献
| [1] | Hatada R;BABA K .Preparation of Hydrophobic Diamond Like Carbon Films by Plasma Source Ion Implantation[J].Nuclear Instruments and Methods in Physics Research B:Beam Interaction with Materials and Atoms,1999,148:655-658. |
| [2] | Zhan Z J;MA X X;Sun Y et al.The Mechanical Properties of an Al Alloy by PBII and Solution - aging Treatment[J].Surface and Coatings Technology,2000,128-129:256-259. |
| [3] | Hongbing Ji;Lifang Xia;Xinxin Ma;Yue Sun .Tribological performance of Ti-6Al-4V plasma-based ion implanted with nitrogen[J].Wear: an International Journal on the Science and Technology of Friction, Lubrication and Wear,2000(1/2):40-45. |
| [4] | Walter KC.;Baker NP.;Munson CP.;Scarborough WK.;Scheuer JT.;Wood BP.;Conrad JR.;Sridharan K.;Malik S.;Bruen RA.;Nastasi M. .Advances in PSII techniques for surface modification[J].Surface & Coatings Technology,1998(0):205-211. |
| [5] | YU W D;XIA L F;Sun Y et al.Metal PSII Using a UBM Cathode[J].Surface and Coatings Technology,2000,128-129:240-244. |
| [6] | Chen A;FIRMISS J;Conrad J R .Dose analysis of nitrogen PSII treatment of titanium alloys[J].Journal of Vacuum Science and Technology B:Microelectronics and Nanometer Structures,1994,12(02):918-922. |
| [7] | DAWSON P T;TZATZOV P T .[J].Surface Science,1985,149:105-109. |
| [8] | CHILDS K D;CARLSON B A;LAVANIER L A.Handbook of Auger Electron Spectroscopy[M].Eden Prairie Minnesota:Physical Electronics Inc,1996 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%