硬质膜由于具有良好的耐磨、耐蚀和耐热等特点,所以在航天、化工和机械等领域获得了日益广泛的应用,而硬质膜的组成和制备工艺也随之得到不断发展.本文综述了TiN类硬质膜的应用和制备硬质膜常用的气相沉积方法、工艺参数及其优缺点.阐明了制备工艺正向着以三束(电子束、离子束和激光束)为基础多种工艺复合的方向发展.而硬质膜正向着多元膜、梯度膜和纳米复合膜方向发展.
参考文献
[1] | 沈保罗,高升吉,张治安,高见.CVD和PVD及其在工、模具上的应用[J].机械制造,2002(08):17-18. |
[2] | L. Cunha;M. Andritschky;K. Pischow;Z. Wang .Microstructure of CrN coatings produced by PVD techniques[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1999(0):465-471. |
[3] | Wang YC .A study of PVD coatings and die materials for extended die-casting die life[J].Surface & Coatings Technology,1997(1/3):60-63. |
[4] | 王银川.真空镀膜技术的现状及发展[J].现代仪器,2000(06):1-4. |
[5] | 赵南方;杨巧勤;赵立华 等.Ti-B-N薄膜沉积过程中离子轰击的效应[J].中国陶瓷,1998,34(02):26-29. |
[6] | 高阳,陈孟成,李建平,汝继来,王仁智.射频磁控溅射沉积热障涂层结构特征及高温氧化性能[J].航空材料学报,2000(03):61-66. |
[7] | 高见,李建平,马文存,吴婉,沈保罗,易勇.TiC-TiN-TiC-Al2O3涂层CP3型硬质合金抗弯强度及其分散性的研究[J].工具技术,2002(11):10-12. |
[8] | 林翠,杜楠,赵晴,尹茂生,张瑞之.电子束蒸发镀铝-铬合金涂层研究[J].南昌航空工业学院学报(自然科学版),2000(04):31-35. |
[9] | Roos E.;Maile K.;Lyutovich A.;Gusko A.;Udoh A. .(Cr-Al) bi-layer coatings obtained by ion assisted EB PVD on C/C-SiC composites and Ni-based alloys[J].Surface & Coatings Technology,2002(0):429-433. |
[10] | S. Schiller;Chr. Metzner;O. Zywitzki .New coatings on metal sheets and strips produced using EB PVD technologies[J].Surface & Coatings Technology,2000(1/3):240-245. |
[11] | AREZZO F;GIMONDO P;HASHIMOTO M et al.Characterization of TiN films deposited onto stainless steel strips by continuous dry-coating process[J].Thin Solid Films,1996,290-291:226-231. |
[12] | 赵军,田野,于文馨,王希囡.多弧离子镀沉积氮化钛铝超硬膜的研究[J].真空,2002(01):8-10. |
[13] | 黄元林,李长青,马世宁.多弧离子镀Ti(C,N)/TiN多元多层膜研究[J].材料保护,2003(06):6-8. |
[14] | 关世瑛.TiN薄膜对碳钢和铬钢耐磨性影响的研究[J].哈尔滨理工大学学报,2003(02):87-89. |
[15] | 关世瑛.TiN薄膜厚度对耐磨性影响的研究[J].哈尔滨理工大学学报,2003(03):114-116. |
[16] | 惠迎雪,杭凌侠,徐均琪,陈伟.不同磁控溅射模式膜厚均匀性研究[J].西安工业学院学报,2003(01):32-36. |
[17] | 李瑞文,邹觉生,鲜晓斌.负偏压对Be上磁控溅射离子镀Al膜结构影响的研究[J].真空,2002(03):30-32. |
[18] | X. T. Zeng .TiN/NbN superlattice hard coatings deposited by unbalanced magnetron sputtering[J].Surface & Coatings Technology,1999(1/2):75-79. |
[19] | J. H. Hsieh;C. Liang;C. H. Yu;W. Wu .Deposition and characterization of TiAlN and multi-layered TiN/TiAlN coatings using unbalanced magnetron sputtering[J].Surface & Coatings Technology,1998(1/3):132-137. |
[20] | AGER M A;GAGO R;FERN(A)NDEZ M et al.Deposition of TiN/AlN bilayers on a rotating substrate by reactive sputtering[J].Surface and Coatings Technology,2002,157(01):26-33. |
[21] | PETER S;GOGGENGACK H;RICHTER F et al.An analysis of the TiN plasma chemical vapor deposition process based on optical emission spectroscopy measurements[J].Thin Solid Films,2001,398-399:343-348. |
[22] | Jan Yih-Trong .Fabrication of nano-size conic diamond arrays by bias assisted PCVD[J].Diamond and Related Materials,1999(2 Mar):772-780. |
[23] | K. -T. Rie;J. Wohle .Plasma-CVD of TiCN and ZrCN films on light metals[J].Surface & Coatings Technology,1999(1/3):226-229. |
[24] | YULONG Shi;HONGRUI Peng;YAN Xie et al.Plasma CVD of hard coatings Ti (CNO) using metallo -organic compound Ti (OC3 H7)4[J].Surface and Coatings Technology,2000,132(01):26-30. |
[25] | J. Wohle;C. Pfohl;K. -T. Rie;A. Gebauer-Teichmann;S. K. Kim .Deposition of TiCN and ZrCN layers on light metals by PACVD method using radio frequency and pulsed-DC plasma[J].Surface & Coatings Technology,2000(1/3):127-130. |
[26] | 刘泉,周健,余卫华,刘桂珍.WC-8.0%Co基底上微波等离子化学气相沉积金刚石膜[J].中国有色金属学报,2001(01):116-119. |
[27] | Patil DS.;Venkatramani N.;Pandey M.;Venkateswaran S. D'Cunha R.;Ramachandran K. .Microwave plasma chemical vapour deposition of diamond like carbon thin films[J].Journal of Alloys and Compounds: An Interdisciplinary Journal of Materials Science and Solid-state Chemistry and Physics,1998(1/2):130-134. |
[28] | Lackner JM.;Waldhauser W.;Ebner R.;Keckes J.;Schoberl T. .Room temperature deposition of (Ti,Al)N and (Ti,Al)(C,N) coatings by pulsed laser deposition for tribological applications[J].Surface & Coatings Technology,2004(0):447-452. |
[29] | Silvestre AJ.;Conde O. .TiN films deposited by laser CVD: a growth kinetics study[J].Surface & Coatings Technology,1998(1/3):153-159. |
[30] | Oliveira JC.;Conde O. .DEPOSITION OF BORON CARBIDE BY LASER CVD - A COMPARISON WITH THERMODYNAMIC PREDICTIONS[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,1997(1/2):29-37. |
[31] | 王浩.不锈钢表面脉冲激光镀类金刚石碳膜[J].电加工,1997(05):38-40. |
[32] | 谢中维.离子束辅助沉积(Ti,Al)N梯度薄膜的结合强度[J].真空,1998(02):23. |
[33] | Karvankova P.;Veprek-Heijman MGJ.;Zindulka O.;Bergmaier A.;Veprek S. .Superhard nc-TiN/a-BN and nc-TiN/a-TiBx/a-BN coatings prepared by plasma CVD and PVD: a comparative study of their properties[J].Surface & Coatings Technology,2003(0):149-156. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%