用磁控溅射方法在电解纯Ni上溅射了一层与其成分相同的纳米晶涂层.研究了纯Ni及其溅射纳米晶涂层在700℃～900℃的氧化行为.结果表明:在同一温度下,纳米晶纯Ni的氧化增重高于纯Ni,即经溅射纳米化纯Ni的氧化速率变快.利用扫描隧道显微镜、带能谱的扫描电镜和X射线衍射对样品的表面和截面进行了分析,并讨论了其氧化机理.
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