采用zrCl4-CH4-H2-Ar反应体系,冷态输送ZrCl4粉末化学气相沉积(CVD)制备ZrC涂层.采用热力学计算并结合实验结果分析了冷态输送ZrCl4化学气相沉积ZrC涂层的特点,采用X射线衍射仪和扫描电镜分析了涂层的物相组成、表面形貌和组织结构.结果表明:冷态输送ZrCl4粉末大幅度降低了ZrC的化学气相沉积温度,且容易获得大面积、结构均匀的ZrC涂层.涂层表面由直径在20 ～ 80nm之间的颗粒组成,为无规则“田状”组织.涂层结构主要为柱状晶,沿(200)面优先生长.分析了这种新型“田状”ZrC涂层组织的形成机理以及ZrC涂层的生长机制.
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