铝掺杂的氧化锌(ZnO∶Al)透明导电膜是采用射频磁控溅射法在有机衬底(Polypro-pylene adipate, PPA)和Corning 7059玻璃上制备的.详细研究了薄膜的结构性质、光学和电学性质随薄膜厚度的变化关系.制备的ZnO∶Al薄膜具有(002)面的单一择优取向的多晶六角纤锌矿结构,性能优良的薄膜电阻率在两种衬底上分别为2.55×10-3Ω·cm和1.89×10-3Ω·cm,平均透射率达到了80%和85%.
参考文献
[1] | Chopra K L,Major S,Pandya D K. Transparent conductors-A status review[J]. Thin Solid Films, 1983, 102(1):1-46. |
[2] | Yang T L,Zhang D H,Ma J,et al. Transparent conducting ZnO∶Al films deposited on organic substrates deposited by r.f. magnetron-sputtering[J]. Thin Solid Films, 1998, 326:60-62. |
[3] | Sieber S, Wanderka N, Urban I, et al. Electron microscopic characterization of reactively sputtered ZnO films with different Al-doping levels[J]. Thin Solid Films,1998, 330:108-113. |
[4] | Jin Z C, Hamberg I,Granqvist C G, et al. Optical properties of sputter-deposited ZnO∶Al thin films[J].J.Appl.Phys., 1988, 64(10):5117-5131. |
[5] | Minami T, Nanto H, Takata S, et al. Optical properties of aluminum doped zinc oxide thin solid films prepared by RF magnetron sputtering[J].Jpn. J. Appl. Phys.,1985, 24(8):L605-L607. |
[6] | Ma Jin, Ji Feng, Zhang D H, et al. Optical and electronic properties of transparent conducting ZnO and ZnO∶Al films prepared by evaporating method[J].Thin Solid Films, 1999, 357(2):98-101. |
[7] | Smith Frank T J. Metal organic chemical vapor depostion of oriented ZnO films over large areas[J]. Appl. Phys. Lett.,1983, 43(12):1108-1110. |
[8] | Zhang D H,Brodie D E. Effects of annealing ZnO films prepared by ion-beam-assisted reactive deposition[J]. Thin Solid Films,1994, 238(2):95-100. |
[9] | Tang W,Cameron D C. Aluminum-doped zinc oxide transparent conductors deposited by the sol-gel process[J].Thin Solid Films, 1994, 238(1):83-87. |
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