开发高可靠性的绝缘层薄膜几十年来一直是TFEL显示器研制中的重要努力方向之一.采用双靶脉冲电子束蒸发法制备了Al2O3/TiO2单元结构为10 nm/10 nm、20 nm/20 nm、40 nm/40 nm、总厚度约600 nm的多层复合薄膜,同时采用共蒸发法制备了800 nm的AlxTiyOz复合薄膜,研究了它们的介电性能,并与Al2O3、TiO2单层膜的介电性能做了比较,最后将性能较优的AlxTiyOz薄膜应用到ZnS:Mn TFEL器件中.Al2O3/TiO2多层复合膜随着结构单元中Al2O3、TiO2厚度由10 nm增至40 nm,介电常数由20.2减小到16.1,击穿场强由154 MV/m增至174 MV/m,反映介电损耗的参数ΔVy由0.09 V降为0.04 V,在50 MV/m下漏电流密度由1×10-6 A/cm2增至1×10-4 A/cm2,品质因子由2.62 μC/cm2降为2.46 μC/cm2.AlxTiyOz薄膜的品质因子大于3.6 μC/cm2,应用于ZnS:Mn TFEL器件中获得在200 Hz下较高的L50(58 cd·m-2)、很低的阈值电压(60～70 V),而且各个像素的L-V性能有很好的重复性.
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