为了减少制造工艺的过程,改进的4-Mask工艺中采用Al基的数据线已得到进一步的完善.但这个工艺仍存在很多问题,主要是为减少工艺过程,而引入干法刻蚀对Al有腐蚀作用.本文应用CF4/O2等离子体处理,很好地阻止了对Al的腐蚀,得到很好的效果,对改进后4-Mask工艺的进一步应用具有非常重要的意义.
Improved 4-Mask process applied with Al based data line was developed in order to reduce manufacturing process. This process has several issues. Most of them are Al corrosion because of applying to dry etch for process step reduction. However, it brings a matter to a successfully settlement and meets with good results about Al corrosion prevention using CF4/O2 plasma treatment. Moreover, it brings successfully results to be applied to improved 4-Mask process.
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