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采用化学气相沉积法,以乙炔为碳源,在各种钯膜上制备了碳纳米管薄膜.通过电子显微镜观察了碳管薄膜和钯膜的表面形貌.结果表明,在真空气氛下磁控溅射的钯膜上无法生长碳纳米管.对溅射的钯膜进行大气气氛下的退火处理,则可生长出稀疏的碳纳米管团聚颗粒.采用在氧气气氛下磁控溅射的钯膜作为催化剂,则可显著提高碳管的生长密度和纯度,从而获得致密均匀的碳纳米管薄膜.

The effect of different palladium (Pd)films on the growth behavior of carbon nanotubes (CNTs) film has been investigated. The CNTs film was deposited by thermal chemical vapor deposition with C2 H2 and H2 as precursor. Various Pd films prepared on glass substrates by magnetron sputtering in vacuum or O2 ambience were used as catalysts. Characterization of the Pd and CNTs films was made using scanning electron microscopy, field emission scanning electron microscopy and energy dispersive X-ray spectroscopy. Results show that it is difficult to grow CNTs on 10~40 nm thick Pd films deposited by magnetron sputtering in vacuum. However, on the as-prepared 10 nm thick Pd film after annealing treatment at 760℃ in atmosphere for 5 min, the randomly oriented CNTs and carbon nanofibres were grown, which were aligned in low density and gathered together into some particles. Also,the high purity CNTs were found to distribute evenly in high density on 10 nm thick Pd film deposited by magnetron sputtering in O2 ambience. The present work shows the importance of the preparation condition of the Pd film catalyst for the growth behavior of CNTs film.

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