利用Tsuprem4和Medici软件,研究了多晶硅薄膜晶体管的LDD掺杂参数,如掺杂剂量、离子注入能量对KINK效应的影响,得到了它们之间的关系.计算结果表明,随着LDD掺杂剂量的变化,KINK效应对器件的影响是非线性的且存在一个最小值,在掺杂为2×1012cm-2时达到最小.而LDD掺杂能量对K1NK效应的影响是线性的,即随着离子注入能量的增加,KINK效应的影响变小.
参考文献
[1] | Zhang Shengdong,Zhu Chunxiang,Sin Johnny K O.Ultra-thin elevated channel poly-Si TFT technology for fullyintegrated AMLCD system on glass[J].IEEE Electron Device Lett.,2000,47(3):569-575. |
[2] | Celi F G,Jacobs S J,Kim T S.Organic LED structure with improved efficiency[C]//IEEE Lasers and Electrooptics Society(LEOS),San Francisco,CA:IEEE,1997:366-367. |
[3] | Fumihiko Hayashi,Hiroaki Ohkubo,Toshifumi Takahashi,et al.A highly stable SRAM memory cell with topgated P-N drain poly-Si TFTs for 1.5 V operation[C]//IEDM Tech.Dig.,San Francisco,CA,USA IEEE:1996:283-286. |
[4] | 岳帮辉,魏廷存,樊晓桠.手机用TFT-LCD驱动芯片内置SRAM的研究与设计[J].液晶与显示,2006,21(5):566-570. |
[5] | Young N D,Harkin G,Bunn R M,et al.The fabrication and characterization of EEPROM arrays on glass using a low-temperature poly-Si TFT process[J].IEEE Trans.Electron Devices,1996,43(11):1930-1936. |
[6] | Ling Wang,Fjeldly Tor A,Benjamin Iniguez,et al.Self-heating and kink effects in a-Si:H thin film transistors[J].IEEE Trans.Electron Devices,2000,47(2):387-396. |
[7] | Mariucci L,Fortunato G,.Bonfiglietti A,et al.Polysilicon TFT structures for Kink-effect suppression[J].IEEE Trans.Electron Devices,2004,51(7):1135-1142. |
[8] | Palumbo Domenico,Masala Silvia,Tassini Paolo,et al.Electrical stress degradation of small-grain polysilicon thinfilm transistors[J].IEEE Trans.Electron Devices,2007,54(3);476-482. |
[9] | Wang Mingxiang,Wong Man.An effective channel mobility-based analytical on-current model for polycrystalline silicon thin-film transistors[J].IEEE Trans.Electron Devices,2007,54(4):869-874. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%