利用射频磁控溅射法制备了不同衬底温度的氧化锌(ZnO)薄膜.研究了其场发射特性,分析了场发射特性和衬底温度的变化关系.实验结果表明, 开启电场随着衬底温度的增加呈先增大后减小的趋势,场发射特性的变化是由于衬底温度的改变引起表面形貌的变化所致.衬底温度为300 ℃时沉积的ZnO薄膜样品粗糙度最小,场发射性能最差,其开启场强为1.7 V/μm,场强为3.8 V/μm时电流密度仅为0.001 97 A/cm2;衬底温度为400 ℃时沉积的ZnO薄膜样品表面粗糙度最大,场发射特性也优于其他薄膜;开启场强为0.82 V/μm, 场强为3.8 V/μm时电流密度稳定在0.03 A/cm2.Fowler-Nordheim(F-N)曲线为直线表明, 电子是在外加电场的作用下隧穿表面势垒束缚发射到真空的.
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