介绍了LCoS技术的特点与发展现状,LCoS性能的优劣与硅基片平整度有直接关系,着重进行了LCoS微显示驱动技术表面形貌的研究与改进.通过严格控制工艺步骤,降低台阶高度;合理设计版图布局,使台阶叠加在隔离像素区域的沟槽中,这样既能实现像素电极区域的局部平坦化,又因为沟槽不作为显示区域,对整体显示效果影响较小.
参考文献
| [1] | 刘会刚,耿卫东,商广辉,等.LCoS背投技术及其在中国的发展[J].现代显示,2007,(2):30-34. |
| [2] | De Smet H,Van den Steen J,Van Doorselaer G.On the development of VAN LCOS microdisplays[C]//Lasers and Electro-Optics Society,2003.LEOS 2003.The 16th Annual Meeting of the I EEE,Tucsm,USA:IEEE,2003,(2):814-815. |
| [3] | 代永平,王隆望,刘明,等.CMP平坦化技术在LCoS显示器中的应用[J].光电子技术,2003,23(1):41-45. |
| [4] | 欧毅,宋玉龙,刘明,等.LCoS反射层的实验研究[J].液晶与显示,2005,20(6):554-557. |
| [5] | Choubey A,Andros F,Sammakia B.Study of assembly processes for liquid crystal on silicon (LCoS) microdisplays[C]//The Ninth Intersociety Conference on Thermal and Thermomechanical Phenomena in Electronic Systems,Las Vegas,Nevada,IEEE,2004:77-84. |
| [6] | Underwood I,Breslin J A,Burns DC,et al.Advances in pixel design and wafer fabrication for liquid crystal over silicon SLMs[C]//Advanced Applications of Lasers in Materials Processing,1996/Broadband Optical Networks/Smart Pixels/Optical MEMs and Their Applications,IEEE/LEOS 1996 Summer Topical Meetings,CO.USA:IEEE,1996:13-14. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%