通过对最近两次SOI国际会议的分析，综述了SOI技术取得的新进展。三种SOI技术SIMOX，Smart－cut和BESOI已走向商业化,在高温与辐射环境下工作的SOI电路也走向了市场。近来人们更加重视SOI技术，是因为SOI在实现低压、低功耗电路上的突出优越性。
The new progress at the Silicon－ On－ Insulator (SOI) technology is reviewed, according to the analysis of the recent two SOI international conferences. Three techniques, SIMOX, Smart－ cut and BESOI,become very successful and commercially in producing SOI material. SOI devices have been used in several market applications such as high temperature and radiation hard integrated circuits. Recent－ly much attention has been paid to SOI technology, because the most prominent advantage of SOI circuits is its ability to realize low voltage/low power.
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