使用光强标定的发射光谱( AOES)测量了 CHF3/C6H6混合气体的微波电子回旋共振( ECR) 放电等离子体中基团的分布状态.实验发现随着 CHF3流量的增加 ,成膜基团 CF、 CF2、 CH等的相 对密度增大 ,而刻蚀基团 F的密度也会增加 ,从而使得 a-C:F薄膜的沉积速率降低.同时红外 吸收谱 (IR)分析表明 ,在高 CHF3流量下沉积的 a-C:F薄膜中含有更高的 C-F键成分.可见 在 a-C:F薄膜的制备中 CHF3/(CHF3+ C6H6)流量比是重要的控制参量.
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