利用 SIMOX技术和硅外延工艺制备了厚膜 SOI材料.采用 Secco液腐蚀、椭圆偏振仪 (SE)、 扩展电阻 (SRP)等技术对材料的性能进行了表征,分析了外延硅层中缺陷产生的主要原因.外延层 电阻率纵向分布均匀 ,其缺陷主要来源于衬底缺陷延伸和表面的不平整.用制备的厚膜 SOI材料 制作了脊型光波导并完成了光损耗测试实验 ,得到了传输损耗为 0.4dB/cm的波导结构.
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