利用多层膜零蠕变法,直接测量 Si( 111)单晶片上沉积的 Ag/Ni多层膜界面自由能.通过基 片曲率法实时测量 Ag/Ni多层膜升温退火过程中的应力变化,在 450°C保温,发现此时多层膜达到 平衡状态,最终的平衡应力为 0.57MPa, 计算出 Ag/Ni的界面自由能γ int为 0.63 J/m2, 最后结合 XRD测试结果和 SEM剖面形貌,从界面能角度对多层膜的稳定性进行了分析讨论.
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