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使用金相显微镜、推力分析仪测试等手段研究了镀碳工艺参数对碳膜的表面形貌、碳膜和石英结合力的影响.获得了一个优化的镀碳工艺参数,即在镀碳温度为950~1100℃,气体流量为4~7ml/h,镀碳时间为6h,冷却时间为12h的条件下得到的碳膜较为均匀,而且和石英结合的较好.使用该工艺条件镀膜的石英管生长出的CdZnTe晶体表面光洁,位错密度低,约为4×104cm-2.

参考文献

[1] Rosch W;Carlson F .Computed stress fields in GaAs during vertical Bridgman growth[J].Journal of Crystal Growth,1991,109:75-81.
[2] Butler J F;Doty F P;Apotovsky B et al.Gamma and X - ray detectors manufactured from Cd1 -xZnxTe grown by a high pressure Bridgman method[J].Materials Science and Engineering B,1993,16:291-295.
[3] Pfeiffer M;Muhlberg M .Interface shape observation and calculation in crystal growth of CdTe by the vertical Bridgman method[J].Journal of Crystal Growth,1992,118:269-276.
[4] BRUNET P;Katty A;Schneider D et al.Horizontal Bridgman growth of large high quality Cd1- yZnyTe crystals[J].Materials Science and Engineering B,1993,16:44-47.
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