PDMS是制作微流控芯片的主要材料.PDMS芯片制作的主要方法是模塑法,模塑法要求有良好的塑性成型模具.SU-8以其良好的微加工特性,目前已广泛应用于微机械结构的制作,也用于PDMS塑性成型的模具.本文根据模具的特殊性,如平整、无裂纹、可多次使用等要求,研究了影响SU-8模具结构与基底材料硅片的黏附性和形成裂纹的因素,优化了SU-8微模具加工工艺,在以0.5℃/min进行升降温、210 mJ/cm2的曝光剂量、200℃条件下硬烘30min条件下得到较好的SU-8模具,提供了一种快速、复用性高、低成本的PDMS微芯片塑性成型的SU-8模具的制作方法.
参考文献
[1] | Thiebaud P.;Lauer L.;Knoll W.;Offenhausser A. .PDMS device for patterned application of microfluids to neuronal cells arranged by microcontact printing[J].Biosensors & Bioelectronics: The International Journal for the Professional Involved with Research, Technology and Applications of Biosensers and Related Devices,2002(1/2):87-93. |
[2] | Hofmann O;Wang XH;Cornwell A;Beecher S;Raja A;Bradley DDC;deMello AJ;deMello JC .Monolithically integrated dye-doped PDMS long-pass filters for disposable on-chip fluorescence detection[J].Lab on a chip,2006(8):981-987. |
[3] | Wu M H et al.A SU -8/PDMS hybrid microfluidic device with integrated optical fibers for online monitoring of lactate[J].Biomedical Microdevices,2005,7(04):323-329. |
[4] | Cooper J;McDonald D C D;Janelle R Anderson.Fabrication of microfluidic systems in poly(dimethylsiloxane)[J].Electrophoresis,2000(21):27-40. |
[5] | Lee K Y S Z;Gelorme J D .Micromachining applications of a high resolution ultrathick photoresist[J].Journal of Vacuum Science and Technology B:Microelectronics and Nanometer Structures,1995,13(06):3012-3016. |
[6] | Lorenz H.;Fahrni N.;Labianca N.;Renaud P.;Vettiger P.;Despont M. .SU-8 - A LOW-COST NEGATIVE RESIST FOR MEMS[J].Journal of Micromechanics and Microengineering,1997(3):121-124. |
[7] | SU -8 2000 Permanent Epoxy Negative Photoresist processing guidelinesfor:SU-8 2025,SU-8 2035,SU-8 2050 and SU-8 2075[OL].http://www.microchem.com |
[8] | Ribeiro JC;Minas G;Turmezei P;Wolffenbuttel RF;Correia JH .A SU-8 fluidic microsystem for biological fluids analysis[J].Sensors and Actuators, A. Physical,2005(0):77-81. |
[9] | Sikanen T;Tuomikoski S;Ketola RA;Kostiainen R;Franssila S;Kotiaho T .Characterization of SU-8 for electrokinetic microfluidic applications[J].Lab on a chip,2005(8):888-896. |
[10] | Biow Hiem Ong;Xiaocong Yuan;Swee Chuan Tjin .Adjustable refractive index modulation for a waveguide with SU-8 photoresist by dual-UV exposure lithography[J].Applied optics,2006(31):8036-8039. |
[11] | 王彬,陈翔,许宝建,金庆辉,赵建龙,徐元森.基于SU-8负胶的微流体器件的制作及研究[J].功能材料与器件学报,2006(03):215-219. |
[12] | 曾永彬,朱荻,明平美,胡洋洋.基于BP神经网络的SU-8光刻胶工艺参数优选研究[J].机械科学与技术,2006(09):1082-1084,1116. |
[13] | 许宝建,金庆辉,赵建龙.基于多层SU-8结构的微喷阵列芯片的制作与应用研究[J].功能材料与器件学报,2006(05):377-382. |
[14] | 张金娅,陈迪,朱军,李建华,方华斌,杨斌.超厚SU-8负胶高深宽比结构及工艺研究[J].功能材料与器件学报,2005(02):251-254. |
[15] | 方肇伦.微流控分析芯片[M].北京:科学出版社,2003 |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%