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采用射频反应溅射制备了纳米晶WO3薄膜.基于Berg理论建立了WO3射频反应溅射模型,并分析工艺参数对滞回曲线的影响,基于研究了抽速、基片温度、馈入功率、靶片间距和溅射靶等离子体溅射面积的影响.提出了一种新的消除滞回曲线的制备纳米晶WO3薄膜的方法和优化的工艺参数.论文制备了性能良好的电致变色纳米晶WO3薄膜.分别用环境扫描电镜(ESEM)、X射线光电子能谱(XPS),X射线衍射(XRD)和分光光度计测试了该薄膜,该薄膜在可见光波段,不变色时的透光率大于95%,变色后为65%.纳米晶WO3薄膜的晶粒尺寸在40纳米左右,其高比表面积和缺陷态为电致变色的例子扩散提供了通道.

Nanocrystalline WO3 thin films is prepared by RF reactive sputtering in this paper. Based on the a-nalysis of the Berg hysteresis model, we analyze the process parameter influence on the hysteresis effect, in-clusing pumping speed, temperature of substrate and target, input power, target to substrate distance and area of target. A new active feedback control method is present in this paper to eliminate hysteresis effect and de-positing nanocrystalline WO3 thin films. Through measurement of its electro-discoloring properties, we get a good tungsten oxide films. The tungsten oxide films have a high visible light transmission rate before discolo-ring, the maximum value reach 95% at the visible light wave length 550nm. After discoloring, visible light transmission rate decrease to 30% at wave length 550nm. XPS and XRD results show that the tungsten oxide films is nanocrystalline. The nanocrystalline WO3 has a very high ratio surface area and those surface defect provide ion mere diffusion channel, so nano-crystaln has a good electro-discoloring property. The better size of Nano-crystal is about 40nm.