采用等离子体增强射频磁控溅射沉积方法,在室温下制备了Fe-O合金薄膜.研究了氧的掺杂量和薄膜厚度对薄膜软磁和高频特性的影响.结果发现少量氧的掺杂不导致低饱和磁化强度铁氧化物的形成,但可使薄膜晶粒细化,矫顽力下降.在薄膜厚度低于150 nm且氧气与氩气相对流量比为2.4%的条件下,薄膜的实部磁导率高达1100且能够维持到1GHz.
The effect of oxygen - doping and thickness has been studied on soft magnetic properties and high - frequency characteristics of Fe - O alloy thin films prepared by a helicon - plasma - enhanced RF magnetron sputter- deposition at room temperature. A reduction in coercivity due to grain refinement was achieved using very low dose of oxygen which did not lead to the formation of crystalline Fe oxides with the low saturation magnetization. The real part (μ' ) of permeability has a high value of 1100 and is maintained up to 1 GHz below 150 nm for the relative 02 flow ratio of RO2 = 2.4%.
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