采用脉冲激光沉积技术,在Si(100)和石英基片上制备了硼碳氮薄膜(BCN).利用X射线衍射(XRD),傅里叶变换红外光谱(FTIR)、X射线光电子能谱(XPS)和紫外-可见分光光度计对BCN薄膜进行了表征,研究了激光能量密度对BCN薄膜沉积速率、组分、结构和光学性能的影响.FTIR和XPS分析结果表明BCN薄膜中包含B-C,C-N和N-B化学键,说明实现了B、C和N的原子级化合.当激光能量密度从1 J/cm2增加到6 J/cm2时,BCN薄膜的沉积速率加快,N含量由7.2%增加到15%,光学禁带宽度(Eg)从4.02 eV降低到3.82 eV,Eg的降低主要与BCN薄膜中碳含量的增加有关.
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