使用低压MOCVD生长应变InGaAs/GaAs 980 nm量子阱.研究了生长温度、生长速度对量子阱光致发光谱(PL)的影响.并将优化后的量子阱生长条件应用于980 nm半导体激光器的研制中,获得了直流工作下,阈值电流为19 mA,未镀膜斜率效率为0.6 W/A,输出功率在100 mW的器件.
参考文献
[1] | Wang C A, Groves S H. New materials for diode laser pumping of solid-state lasers [J]. IEEE Journal of Quantum Electronics, 1992, 28(4): 942. |
[2] | Albert O. Reliability aspects of 980 nm pump lasers in EDFA applications [J]. Proc. of SPIE, 1998, 3284: 20-27. |
[3] | Chand N, et al. Growth and fabrication of high-performance 980 nm strained InGaAs quantum-well lasers for erbium-doped fiber amplifiers [J]. IEEE Journal of Quantum Electronics, 1994, 30(2): 424-440 |
[4] | Matthews W, Jackson D C, Chambers A, et al. Effect of coherency strain and misfit dislocations on the mode of growth of thin films [J]. Thin Solid Films, 1975, 26(1): 129-134. |
[5] | Snyder C W, Orr B G, et al. Hydrogen complexes and their vibrations in undoped crystalline silicon [J]. Phys.Rev. Lett., 1991, (66): 253-258. |
[6] | Dietmar S, Zhong P, Tomoyaki M, et al. Effect of surface quality on overgrowth of highly strained GaInAs/GaAs quantum wells and improvement by a strained buffer layer [J]. Jpn. J. Appl. Phys., 1999, 38(9): 5023-5027. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分:
-
10%
-
20%
-
30%
-
40%
-
50%