应用ATLAS模拟软件,设计了吸收层与倍增层分离的(SAM)4H-SiC雪崩光电探测器(APD)结构.分析了不同外延层厚度和掺杂浓度对器件光谱响应的影响,对倍增层参数进行优化模拟,得出倍增层的最优化厚度为0.26 μm,掺杂浓度为9.0×1017 cm-3.模拟分析了该APD的反向IV特性、光增益、不同偏压下的光谱响应和探测率等,结果显示该APD在较低的击穿电压-66.4 V下可获得较高的倍增因子105;在0V偏压下峰值响应波长(250 nm)处的响应度为0.11A/W,相应的量子效率为58%;临近击穿电压时,紫外可见比仍可达1.5×103;其归一化探测率最大可达1.5×1016 cmHz1/2W-1.结果显示该APD具有较好的紫外探测性能.
参考文献
[1] | Harris C I,Savage S,Konstantinov A,et al.Progress towards SiC products[J].Appl.Surf.Sci.,2001,184:393-398. |
[2] | Powell A R,Rowland L B.SiC materials-progress,status and potential roadblocks[J].Proc.IEEE,2002,90:942-955. |
[3] | Ng B,Yan F,David J,et al.Multiplication and excess noise characteristics of thin 4H-SiC UV avalanche photodiodes[J].IEEE Photon.Tech.Lett.,2002,14:1342-1344. |
[4] | Guo X,Beck A,Li X,et al.Study of reverse dark current in 4H-SiC avalanche photodiodes[J].IEEE J.Quant.Elect.,2005,41:562-567. |
[5] | Sciuto A,Roccaforte F,Franco S D,et al.High responsivity 4H-SiC Schottky UV photodiodes based on the pinch-off surface effect[J].Appl.Phys.Lett.,2006,89:081111(1-3). |
[6] | Liu X F,Sun G S,Li J M,et al.Vertical PIN ultraviolet photodetectors based on 4H-SiC homoepilayers[J].Phys.Star.Sol.(c),2007,4(5):1609-1612. |
[7] | Chiou Y Z.DC and noise characteristics of 4H-SiC metal-semiconductor-metal ultraviolet photodetectors[J].Japanese J.Appl.Phys.,2004,43(5A):2432-2434. |
[8] | Wu Zhengyun,Xin Xiaobin,Yan Feng,et al.Fabrication of MSM structure UV photodetector on 4H-SiC[J].Chinese Journal ofQuantum Electronics(量子电子学报),2004,21(3):269-272 (in Chinese). |
[9] | Liu H,Zheng X,Zhou Q,et al.Double mesa sidewall silicon carbide avalanche photodiode[J].IEEE J.Quant.Elect.,2009,45:1524-1527. |
[10] | Zhu Huili,Chen Xiaping,et al.A study of p-type Ohmic contact for 4H-SiC avalanche photodetector[J].Chinese Journal of Quantum Electronics(量子电子学报),2007,24(6):743-747 (in Chinese). |
[11] | Yan F,Luo Y,Zhao J H,et al.4H-SiC visible blind UV avalanche photodiodes[J].Elect.Lett.,1999,35(11):929-930. |
[12] | Yan F,Zhao J H,Olsen G H.Demonstration of the first 4H-SiC avalanche photodiodes[J].Solid-State Electronics,2000,44:341-346. |
[13] | Guo X,Rowland L B,Dunne G T,et al.Demonstration of ultraviolet separate absorption and multiplication 4H-SiC avalanche photodiodes[J].IEEE Photon.Tech.Lett.,2006,18(1):136-138. |
[14] | Zhu H,Chen X,Cai J,et al.4H-SiC ultraviolet avalanche photodetectors with low breakdown voltage and high gain[J].Solid-State Electronics,2009,53:7-10. |
[15] | Atlas User's manual[Z].silvaco International,2002. |
[16] | Konstantinov A O,Wahab Q,Nordell N,et al.Ionization rates and critical fields in 4H silicon carbide[J].Appl.Phys.Lett.,1997,71(1):90-92. |
[17] | Yan F,Xin X,Alexandrov P,et al.Development of ultra high sensitivity UV silicon carbide detectors[J].Materials Science Forum,2006,527-529:1461-1464. |
[18] | Liu X F,Sun G S,Li J M,et al.Vertical PIN ultraviolet photodetectors based on 4H-SiC homoepilayers[J].Phys.Stat.Sol.(c),2007,4:1609-1612. |
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