四配位非晶碳薄膜是近年来发展的一种新型宽带隙半导体材料,具有独特的物理和化学特性.本文对四配位非晶碳薄膜的研究意义,制备方法,形成机理,结构和性能表征及应用前景作较全面的介绍.
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