在半导体领域的金属有机物化学气相沉积（MOCVD）过程中，排出含有剧毒AsH3和PH3的氢气，必须经过治理达标才能放空。为此，在从瑞典引进的MOCVD装置VP50-RP中，配套使用了德国Drager B3P3滤毒罐。研制出一种新型四元浸渍活性炭及滤毒罐，其在同等条件下对氢气流中AsH3和PH3的脱除能力为Drager B3P3罐的2倍～3倍。
Special four-component-impregnated activated carbon as well as the semiconductor canisters packed with it has been developed to clean the exhaust H2 stream containing AsH3 and PH3 in the metal organic compound vapor deposit (MOCVD) or metal organic vapor phase extent (MOVPE) processes in semiconductor field. Its lifetime is 2 or 3 times longer than that of the sorbent packed in the Drager B3P3 canisters, which are used as the necessary canisters to remove AsH3 and PH3 in the MOCVD equipment of VP50-RP made in Sweden in 1988.
参考文献
| [1] | Fritzenivallner H M .Application of positive pressure systems for compressed-air breathing apparatus in the semiconductor industry[J].Drager Review,1988(62):33-39. |
| [2] | Blicte P E .[P].PB 158505,1945. |
| [3] | 何启泰.化学防护技术基础[M].北京:兵器工业出版社,1996:60-92. |
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