在传统工业型热丝化学气相沉积(HFCVD)反应腔内,相关工艺参数取模拟计算优化值的条件下,采用XRD,SEM及Raman光谱等分析手段研究了单晶Si (100)上较大面积金刚石薄膜的动力学生长行为,讨论了晶格取向的变化规律.结果表明:优化工艺参数条件下,在模拟计算的衬底温度和气体温度分布均匀的区域内,沉积的金刚石薄膜虽存在一定的内应力,但整体薄膜连续、均匀,几何晶形良好,质量较高,生长速率达1.8 μm/h.薄膜生长过程中晶形显露面受衬底温度和活性生长基团浓度的影响较大.
参考文献
| [1] | Badzian A R;Devries R C .Crystallization of diamond from the gas phase(Part 1)[J].Materials Research Bulletin,1988,23:385-400. |
| [2] | Corat E J;Goodwin D G .Temperature dependence of species concentrations near the substrate during diamond chemical vapor deposition[J].Journal of Applied Physics,1993,74(03):2021-2029. |
| [3] | Evans E A;Angus J C .Microbalance studies of diamond nucleation and growth rates[J].Diamond and Related Materials,1996,5:200-205. |
| [4] | Matsui Y;Yabe H;Hirose Y .The numerical simulation of diamond synthesis from acetylene flames[J].Diamond and Related Materials,1993,2:7-13. |
| [5] | 满卫东.金刚石薄膜[J].新型炭材料,2002(02):77-77. |
| [6] | 满卫东,汪建华,王传新,马志斌.金刚石薄膜的性质、制备及应用[J].新型炭材料,2002(01):62-70. |
| [7] | 金曾孙,姜志刚,白亦真,吕宪义.直流热阴极PCVD法制备金刚石厚膜[J].新型炭材料,2002(02):9-12. |
| [8] | 金曾孙,姜志刚,胡航,曹庆忠.热阴极DC-PCVD方法制备的金刚石厚膜的生长特性和内应力[J].新型炭材料,2003(01):65-68. |
| [9] | Aiying WANG,Chao SUN,Rongfang HUANG,Lishi WEN.Simulations of Temperature Field in HFCVD Diamond Films over Large Area[J].材料科学技术学报(英文版),2003(01):22-26. |
| [10] | 汪爱英,孙超,黄荣芳,闻立时.热丝CVD方法中气体状态参数的二维模拟计算[J].材料研究学报,2003(04):345-352. |
| [11] | 汪爱英,纪爱玲,邹友生,孙超,黄荣芳,闻立时.管道热丝CVD金刚石膜反应器温度场的数值计算[J].人工晶体学报,2002(06):576-582. |
| [12] | Knight D S;White W B .Characterization of diamond films by Raman spectroscopy[J].Journal of Materials Research,1989,4(02):385-393. |
| [13] | Mohrbacher H;Acker K V;Blanpain B et al.Comparative measurement of residual stress in diamond coatings by low-incident beam-angle-diffraction and micro-Raman spectroscopy[J].Journal of Materials Research,1996,11(07):1776-1782. |
| [14] | MECHLER J;Mermoux M;Kaend J .Residual stress in diamond films:origins and modeling[J].Thin Solid Films,1999,357(02):189-201. |
| [15] | Spear K E .Diamond-ceramic coating of the future[J].Journal of the American Ceramic Society,1989,72(02):171-191. |
| [16] | Yarbrough W A;Messier R .Current issues and problems in the chemical vapor deposition of diamond[J].Science,1990,247:688-696. |
| [17] | Sun B W;Zhang X P;Lin Z D .Growth mechanism and the order of appearance of diamond(111) and(100) facets[J].Physical Review B,1993,47(15):9816-9824. |
| [18] | 孙碧武;林彰达 .低压气相合成金刚石的机理研究新进展[J].真空科学与技术学报,1993,13(03):149-163. |
| [19] | Williams B E;Glass J T .Characterization of diamond thin films:diamond phase identification,surface morphology,and defect structures[J].Journal of Materials Research,1989,4(02):373-384. |
| [20] | 陈启谨 .异质基底上化学气相沉积金刚石形核及生长的研究[D].北京:中国科学院物理研究所,1995. |
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