以不同氮离子辅助轰击能量制备CrN膜层,利用纳米压入仪及显微硬度计分别测试单晶Si片上膜层的硬度及断裂韧度K1C使用XRD、XPS及EPMA分析离子轰击能量对镀层组织结构的影响.结果表明,采用能量较低的氮离子轰击得到的涂层,由于金属Cr的存在,涂层硬度虽有所降低,但断裂韧度K1C数值较高.选择较低的4keV辅助轰击能量,在M2高速钢基体上沉积CrN涂层,膜层在空气介质中表现出优异的耐磨减摩特性.但在水介质条件下,由于膜层接触区域的去钝化/再钝化使腐蚀和磨损相互加速,导致CrN膜层摩擦系数,尤其是磨损量明显高于基材.
参考文献
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