以高纯石墨作靶、CHF3/Ar作源气体采用反应磁控溅射法制备出了氟化类金刚石(F-DLC)薄膜.拉曼光谱表明,CHF3相对流量的增加会引起薄膜的D峰与G峰强度之比I(D)/I(G)减小,晶粒增大,芳香环结构比例下降.红外吸收光谱分析证实了这些推论,指出这是由于薄膜中氟含量上升的结果.
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