随着微电子工业的蓬勃发展,光刻技术向着更高分辨率的方向迈进,运用底部抗反射涂层有效消除光刻技术中的驻波效应、凹缺效应,提高关键尺寸均一性和图案分辨率,引起了广大研究者的关注.本文简要介绍了光刻胶和光刻技术,底部抗反射涂层的分类、基本原理、刻蚀工艺以及其发展状况.重点对底部抗反射涂层的最新研究进展进行了总结,尤其是碱溶型底部抗反射涂层在光刻胶中的应用研究,最后对底部抗反射涂层的发展前景和方向进行了展望.
参考文献
| [1] | 魏玮;刘敬成;李虎;穆启道;刘晓亚.微电子光致抗蚀剂的发展及应用[J].化学进展,2014(11):1867-1888. |
| [2] | 许箭;陈力;田凯军;胡睿;李沙瑜;王双青;杨国强.先进光刻胶材料的研究进展[J].影像科学与光化学,2011(6):417-429. |
| [3] | 顾志光;孙钧;郑国祥;龚大卫.BARC工艺在亚微米光刻中的应用[J].固体电子学研究与进展,2005(4):545-548,558. |
| [4] | Hwang SH.;Jung JC.;Lee KK..A novel organic bottom anti-reflective coating material for 193 nm excimer laser lithography[J].Polymer: The International Journal for the Science and Technology of Polymers,200017(17):6691-6694. |
| [5] | Hemant Kumar Raut;V. Anand Ganesh;A. Sreekumaran Nair;Seeram Ramakrishna.Anti-reflective coatings: A critical, in-depth review[J].Energy & environmental science: EES,201110(10):3779-3804. |
| [6] | Levi Bourke;Richard J. Blaikie.Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography[J].Journal of vacuum science and technology, B. Nanotechnology & microelectronics: materials, processing, measurement, & phenomena: =JVST B,20146(6):06FE03-1-06FE03-5. |
| [7] | Eun-Mi Park;Jinnil Choi;Byung Hyun Kang;Ki-Young Dong;YunKwon Park;In Sang Song;Byeong-Kwon Ju.Investigation of the effects of bottom anti-reflective coating on nanoscale patterns by laser interference lithography[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,201113(13):4220-4224. |
| [8] | Libor Vyklicky;Wu-Song Huang;Irene Popova.A New Breed of Wet-Developable BARC Materials[J].Journal of Photopolymer Science and Technology,20091(1):17-24. |
| [9] | 丘志春 .湿度对应用有机BARC光刻工艺产品良率的影响及其工艺改进策略[D].上海交通大学,2013. |
| [10] | 袁烽 .对光刻工艺中在光阻底部增加抗反射涂层(BARC)的研究[D].天津大学,2008. |
| [11] | 张军 .基于等效介质近似模型抗反射涂层的研究[D].电子科技大学,2013. |
| [12] | James Cameron;John Amara;Jin Wuk Sung.Design and Development of Developable BARCs (DBARCs) for Advanced Lithographic Applications[J].Journal of Photopolymer Science and Technology,20105(5):721-729. |
| [13] | Satoshi Takei;Tetsuya Shinjo;Yasushi Sakaida.Study of High Etch Rate Bottom Antireflective Coating and Gap Fill Materials Using Dextrin Derivatives in ArF Lithography[J].Japanese journal of applied physics,200711(11):7279-7284. |
| [14] | Munirathna Padmanaban;Takanori Kudo;Srinivasan Chakrapani.PAG and Quencher Effects on DBARC Performance[J].Journal of Photopolymer Science and Technology,20115(5):479-486. |
| [15] | Saptarshi Chatterjee;S. Ramakrishnan.A novel photodegradable hyperbranched polymeric photoresist[J].Chemical communications,201394(94):11041-11043. |
| [16] | 庞玉莲;邹应全.光刻材料的发展及应用[J].信息记录材料,2015(1):36-51. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%