Tungsten-doped indium oxide (IWO) thin films were deposited on glass substrate by DC reactive magnetron sputtering. The effects of sputtering power and growth temperature on the structure, surface morphology, optical and electrical properties of IWO thin films were investigated. The thickness and surface morphology of the films are both closely dependent on the sputtering power and the substrate temperature. The transparency of the films decreases with the increase of the sputtering power but is not seriously influenced by substrate temperature. All the IWO thin film samples have high transmittance in near-infrared spectral range. With either the sputtering power or the growth temperature increases, the resistivity of the film decreases at the beginning and increases after the optimum parameters. The as-deposited IWO films with minimum resistivity of 6. 4× 10-4 Ω·cm were obtained at a growth temperature of 225 ℃ and sputtering power of 40 W, with carrier mobility of 33. 0 cm2· V-1·s-1 and carrier concentration of 2. 8× 1020 cm-3 and the average transmittance of about 81％ in near-infrared region and about 87％ in visible region.
参考文献
| [1] | de Carvalho CN;Lavareda G;Amaral A;Conde O;Ramos AR .InOx semiconductor films deposited on glass substrates for transparent electronics[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2006(23/25):2315-2318. |
| [2] | Selvan JAA;Delahoy AE;Guo SY;Li YM .A new light trapping TCO for nc-Si : H solar cells[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2006(18/19):3371-3376. |
| [3] | Silva VM;Pereira L .The nature of the electrical conduction and light emitting efficiency in organic semiconductors layers: The case of [m-MTDATA]-[NPB]-Alq3 OLED[J].Journal of Non-Crystalline Solids: A Journal Devoted to Oxide, Halide, Chalcogenide and Metallic Glasses, Amorphous Semiconductors, Non-Crystalline Films, Glass-Ceramics and Glassy Composites,2006(50/51):5429-5436. |
| [4] | Szyszka B.;Sittinger V.;Jiang X.;Hong RJ.;Werner W.;Pflug A.;Ruske M.;Lopp A. .Transparent and conductive ZnO : Al films deposited by large area reactive magnetron sputtering[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2003(1/2):179-183. |
| [5] | Levinson R;Berdahl P;Akbari H .Solar spectral optical properties of pigments - Part II: survey of common colorants[J].Solar Energy Materials and Solar Cells: An International Journal Devoted to Photovoltaic, Photothermal, and Photochemical Solar Energy Conversion,2005(4):351-389. |
| [6] | Hamberg Ⅰ;Granqvist C.G .Evaporated Sn-doped In2O3 films:basic optical properties and applications to energy-efficient windows[J].Journal of Applied Physics,1986,60(11):123. |
| [7] | Development of radio-frequency magnetron sputtered indium molybdenum oxide[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2003(4):1092-1097. |
| [8] | Miao WN;Li XF;Zhang Q;Huang L;Zhang ZJ;Zhang L;Yan XJ .Transparent conductive In2O3 : Mo thin films prepared by reactive direct current magnetron sputtering at room temperature[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(1/2):70-73. |
| [9] | Xiu XW;Pang ZY;Lv MS;Dai Y;Ye LN;Han SH .Transparent conducting molybdenum-doped zinc oxide films deposited by RF magnetron sputtering[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(6):3345-3348. |
| [10] | Hjortsberg A;Hamberg Ⅰ;Granqvist C.G .Transparent and heat-reflecting indium tin oxide films prepared by reactive electron beam evaporation[J].Thin Solid Films,1982,90(03):323. |
| [11] | Shi-Yao Sun;Jow-Lay Huang;Ding-Fwu Lii .Effects of oxygen contents on the electrical and optical properties of indium molybdenum oxide films fabricated by high density plasma evaporation[J].Journal of Vacuum Science & Technology, A. Vacuum, Surfaces, and Films,2004(4):1235-1241. |
| [12] | Nath Prem;Bunshah R.F;Basol B.M;Staffsud O.M .Electrical and optical properties of In2O3:Sn films prepared by activated reactive evaporation[J].Thin Solid Films,1980,72(03):463. |
| [13] | J. M. Bian;X. M. Li;X. D. Gao;W. D. Yu;L. D. Chen .Deposition and electrical properties of N-In codoped p-type ZnO films by ultrasonic spray pyrolysis[J].Applied physics letters,2004(4):541-543. |
| [14] | Wang H;Tang Z.Y;Sun L;He Y.B Wu Y.X and Li Z.Y .Novel electrode materials for thin-film ultracapacitors:capacitance performance enhancement of TiO2 doped with Ni and graphite[J].Rare Metals,2009,28(03):231. |
| [15] | Hu J.H;Gordon R.G .Textured aluminum-doped zinc oxide thin films from atmospheric pressure chemical-vapor deposition[J].Journal of Applied Physics,1992,71(02):880. |
| [16] | Thickness dependence of optoelectrical properties of tungsten-doped indium oxide films[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2009(21):8846-8854. |
| [17] | 李渊,王文文,张俊英.In_2O_3：W薄膜的制备及光电性能研究[J].功能材料,2011(08):1457-1460. |
| [18] | Li XF;Zhang Q;Miao WN;Huang L;Zhang ZJ .Transparent conductive oxide thin films of tungsten-doped indium oxide[J].Thin Solid Films: An International Journal on the Science and Technology of Thin and Thick Films,2006(4):2471-2474. |
| [19] | Preparation and optical properties of ZnGa_2O_4:Cr~(3+) thin films derived by sol-gel process[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2010(14):p.4702. |
| [20] | Jiang X;Sun C;Hong R.J.Transparent Conductive Oxides Films[M].北京:高等教育出版社,2008:57-69,159,210,233-241,205-207,278. |
| [21] | Liu YD;Lian JS .Optical and electrical properties of aluminum-doped ZnO thin films grown by pulsed laser deposition[J].Applied Surface Science: A Journal Devoted to the Properties of Interfaces in Relation to the Synthesis and Behaviour of Materials,2007(7):3727-3730. |
| [22] | Z. L. Pei;C. Sun;M. H. Tan;J. Q. Xiao;D. H. Guan;R. F. Huang;L. S. Wen .Optical and electrical properties of direct-current magnetron sputtered ZnO:Al films[J].Journal of Applied Physics,2001(7):3432-3436. |
上一张
下一张
上一张
下一张
计量
- 下载量()
- 访问量()
文章评分
- 您的评分：
-
10%
-
20%
-
30%
-
40%
-
50%