采用旋转涂覆法在普通玻璃上制备了Zn0.88Ni0.02Li0.10O薄膜,以X射线和扫描电镜作为表征手段,讨论了不同工艺参数对该薄膜取向和形貌的影响.结果表明:热处理温度和旋涂速度较高时取向增强,形貌较好.VSM磁性测量表明:在玻璃基底和硅基底旋涂的薄膜都没有出现明显的磁滞现象.
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