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以ZnSe多晶料的预处理为例,阐述了Ⅱ-Ⅵ族高熔点化合物的预处理方法与原理.生长单晶体,不仅仅要求原料有足够高的纯度,更为重要的是需要通过原料的预处理,获得具有合适化学比的高纯多晶原料.结合ZnSe材料的升华特性和杂质分布,对区域升华法处理工艺参数进行了分析,确定了源区温度应略低于1100℃,而沉积温度应高于900℃.选择较窄的升华一沉积温度范围更有利于杂质的去除.沉积区的温度越接近单晶生长温度,就越容易获得化学比较为合适的原料多晶.

参考文献

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