以铁片为基体,分别采用直流和双脉冲电源,在AlCl_3-NaCl-KCl-MnCl_2低温熔融盐中获得了Al-Mn合金镀层.用SEM、金相、EDS和XRD研究了Al-Mn合金镀层表面形貌、沉积速度、组成结构及耐腐蚀性能.结果表明,双脉冲镀层更致密,表面更平整,但沉积比直流镀慢;在MnCl_2含量相同的条件下,双脉冲镀层中Mn含量更高;合金镀层结构随镀层中Mn含量的增加,经铝固熔体与非晶相混合、单一非晶态、非晶相与晶态Al_8Mn_5混合三个阶段;单一非晶态镀层耐蚀性比双相镀层好,Mn含量相当的双脉冲镀层耐蚀性比直流镀层好.
Al-Mn alloy coatings were electrodeposited on iron substrate with a low temperature molten salt bath of AlCl_3-NaCl-KCl-MnCl_2 with DC and dual-pulses electric power souses respectively.Surface mor-phology,rate of deposition,composition and microstructure of the obtained deposits were examined by SEM,metalloscopy,EDS and XRD.Corrosion resistance of the Al-Mn alloy coatings was evaluated by po- larization curves.The results show that the Al-Mn alloy coatings prepared by dual-pulses plating is denser and smoother than that obtained by DC-plating.The deposition rate by DC-plating is faster.XRD results show that the phase constituent of the coatings altered with the increase of Mn content in the deposits,I.e,from an Al-Mn solid solution to a single amorphous phase and finally to a mixture of Al_8Mn_5 and amor-phous phase.Polarization curves reveal that corrosion resistance of Al-Mn alloys with single amorphous phase is better than that with dual phase,while coatings prepared by dual-pulses plating is even better.
参考文献
| [1] | Davoedi A,Pan J,Leygraf C.Integrated AFM and SECM for in situ studies of localized corrosion of Al alloys[J].Eleetrochimica Acta,2007,52(27):7697. |
| [2] | Yukihiro K,Nobukazu F,Masato Y.Long-term corrosion resist-ante of Al-Ni-plated material and Al-plated material in molten carbonate environment[J].Journal of Power Sources,2000(86):324. |
| [3] | Tetsuya T,Charles L H,Stafford G R.Electrodeposition of Al-Mo alloys from the lewis acidic aluminum chloride-1-ethyl-3-methy-limidazolium chloride molten salt[J].Journal of The Electro-chemical Society,2004,151(6):379. |
| [4] | Muhammad R A,Atsushi N,Tooru T.Eloctrodeposition of Co-Al alloys of different composition from the AlCl_3-BPC-CoCl_2 room temperature molten salt[J].Electrochimica Aeta,1997,42(12):1819. |
| [5] | Muhammad R A,Atsushi N,Tooru T.Electredeposition of Al-Ni intermetallic compounds from aluminum chloride-N-(n-butyl) pyridinium chloride room temperature molten salt[J].Journal of Eleetroanalytical Chemistry,2001,513(2):111. |
| [6] | Ellina L,Ziomek-Moroz M,Michalski A.Electrochemical deter-mining of penetrating porosity and the chemical and phase com-position of pulse plasma deposited Ti-Al and Ni-Al coatings[J].Intermetallics,2001,9(8):711. |
| [7] | Mikito U,Hirokuni K,Toshiaki O.Co-deposition of Al-Cr-Ni al-loys using constant potential and potential pulse techniques in AlCl_3-NaCl-KCl molten salt[J].Electrochimica Acta,2007,52(7):2515. |
| [8] | Stafford G R,Grushko B,McMichael R D.The electrodeposition of Al-Mn ferromagnetic phase from molten salt electrolyte[J].Journal of Alloys and Compounds,1993,200(1-2):107. |
| [9] | Li J C,Nan S H,Jiang Q.Study of the electrodeposition of Al-Mn amorphous alloys from molten salts[J].Surface and Coatings Technology,1998,106(2-3):135. |
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