利用离子束增强沉积技术， 在 Ｓｉ （１１１） 和 Ｇ Ｃｒ１５ 轴承钢基体上沉积 Ｃｒ Ｎ 镀层研究氮分压、 Ｎ＋ ＋ Ｎ＋２ 离子轰击能量和 Ｎｉｏｎｓ Ｃｒ ａｔｏｍｓ 到达比对镀层组织结构的影响结果表明， Ｃｒ- Ｎ 镀层组织对氮分压敏感， 随着氮分压的增加， 镀层中 Ｃｒ Ｎ 组份增加， 金属 Ｃｒ 及 Ｃｒ２ Ｎ 组份减少； 随着氮离子轰击能量的增加， Ｃｒ- Ｎ 镀层中 Ｃｒ Ｎ （２００） 择优生长； 但当 Ｎ ｉｏｎｓ/Ｃｒ ａｔｏｍｓ 比从１４５ ×１０ － ２ 增至５.８７ ×１０ － ２ 时， 镀层中 Ｃｒ Ｎ 组份非但没有增多， 反而使镀层中的 Ｃｒ 以 Ｃｒ２ Ｏ３ 形态存在.
This paper studies the structure of IBED Cr-N coatings with different parameters such as N partial pressure, N ions bombarding energy
and N ions/Cr atoms ratio. The results show that the chemical composition and structure of the coatings are mainly determined by N partial pressure.
According to N partial pressure increasing, there are an increase of CrN phase and a decrease of Cr and Cr2N phase. The grain orientations of the
coatings are affected by bombarding energy. When N ions/Cr atoms ratio changed from 1.45×10-2 to 5.87×10-2, high N ion flux of bombarding will result in acceleration of sputtering away from the coated CrN layer as well as its decomposition. In the mean time
Cr2O3 is easy to be produced in the layer.
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